Wavelength tunable photoluminescence (PL) of Si-rich silicon nitride (SRSN) film with buried Si nanocrystals (Si-ncs) grown by plasma enhanced chemical vapor deposition (PECVD) under SiH4 and NH3 environment is investigated. Intense broadband visible emissions tunable from blue to red can be obtained from the as-deposited SiNx thin films with increasing NH3 flow rate from 150 to 250 sccm and detuning the SiH4/NH3 flow ratio during deposition. To date, the normalized PL wavelength of SiNx films a
