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MOSIS PARAMETRIC TEST RESULTS
RUN: T1AZ VENDOR: AMI
TECHNOLOGY: SCN15 FEATURE SIZE: 1.6 microns
INTRODUCTION: This report contains the lot average results obtained by MOSIS
from measurements of MOSIS test structures on each wafer of
this fabrication lot. SPICE parameters obtained from similar
measurements on a selected wafer are also attached.
COMMENTS: American Microsystems, Inc. 1.5 micron AB(X)
TRANSISTOR PARAMETERS W/L N-CHANNEL P-CHANNEL UNITS
MINIMUM 4.0/1.6
Vth 0.61 -0.97 volts
SHORT 20.0/1.6
Idss 184 -71 uA/um
Vth 0.57 -0.91 volts
Vpt 10.0 -10.0 volts
WIDE 20.0/1.6
Ids0 < 2.5 < 2.5 pA/um
LARGE 50/50
Vth 0.60 -0.86 volts
Vjbkd 17.0 -14.6 volts
Ijlk <50.0 <50.0 pA
Gamma 0.64 0.47 V^0.5
K' (Uo*Cox/2) 36.1 -12.1 uA/V^2
Low-field Mobility 641.91 215.15 cm^2/V*s
COMMENTS: Poly bias varies with design technology. To account for mask and
etch bias use the appropriate value for the parameter XL in your
SPICE model card.
Design Technology XL
----------------- -------
SCN (lambda=0.6) 0.00
SCN (lambda=0.8) 0.00
AMI_ABN 0.00
POLY2 TRANSISTORS W/L N-CHANNEL P-CHANNEL UNITS
MINIMUM 4.8/3.2
Vth 0.92 -1.19 volts
SHORT 9.6/3.2
Vth 0.90 -1.13 volts
LARGE 28.8/28.
Vth 0.90 -1.10 volts
K' (Uo*Cox/2) 22.6 -7.2 uA/V^2

FOX TRANSISTORS GATE N+ACTIVE P+ACTIVE UNITS
Vth Poly >15.0 <-15.0 volts
BIPOLAR PARAMETERS W/L NPN UNITS
2X1 2X1
Beta 117
V_early 50.5 volts
Vce,sat 0.2 volts
2X2 2X2
Beta 118
V_early 50.4 volts
Vce,sat --- volts
2X4 2X4
Beta 118
V_early 50.2 volts
2X8 2X8
Beta 119
V_early 50.0 volts
Vce,sat --- volts
BVceo 12.2 volts
BVcbo 29.2 volts
BVebo 7.8 volts
PROCESS PARAMETERS N+ACTV P+ACTV POLY POLY2 PBASE MTL1 MTL2 UNITS
Sheet Resistance 51.8 76.4 27.3 21.4 2006.8 0.05 0.03 ohms/sq
Contact Resistance 60.1 45.3 26.3 14.9 0.05 ohms
Gate Oxide Thickness 307 angstrom
PROCESS PARAMETERS N_WELL UNITS
Sheet Resistance 1637 ohms/sq
Contact Resistance ohms
CAPACITANCE PARAMETERS N+ACTV P+ACTV POLY POLY2 M1 M2 N_WELL UNITS
Area (substrate) 293 298 36 24 15 53 aF/um^2
Area (N+active) 1124 723 49 26 aF/um^2
Area (P+active) 1107 716 aF/um^2
Area (poly) 581 44 22 aF/um^2
Area (poly2) 44 aF/um^2
Area (metal1) 40 aF/um^2
Fringe (substrate) 80 154 30 38 aF/um
Fringe (poly) 56 47 aF/um
Fringe (metal1) 60 aF/um
Overlap (N+active) 175 aF/um
Overlap (P+active) 209 aF/um

CIRCUIT PARAMETERS UNITS
Inverters K
Vinv 1.0 1.83 volts
Vinv 1.5 2.14 volts
Vol (100 uA) 2.0 0.31 volts
Voh (100 uA) 2.0 4.54 volts
Vinv 2.0 2.35 volts
Gain 2.0 -15.87
Ring Oscillator Freq.
DIV64 (31-stg,5.0V) 36.93 MHz
Ring Oscillator Power
DIV64 (31-stg,5.0V) 1.52 uW/MHz/gate
 T1AZ SPICE LEVEL3 PARAMETERS
*
* DATE: Dec 18/01
* LOT: T1AZ WAF: 5101
* DIE: N_Area_Fring DEV: N3740/10
* Temp= 27
.MODEL CMOSN NMOS ( LEVEL = 3
+ TOX = 3.07E-8 NSUB = 2.75325E15 GAMMA = 0.7620845
+ PHI = 0.7 VTO = 0.6298903 DELTA = 0.8569392
+ UO = 702.9336344 ETA = 9.99916E-4 THETA = 0.0734963
+ KP = 7.195017E-5 VMAX = 2.766785E5 KAPPA = 0.5
+ RSH = 0.0474566 NFS = 6.567094E11 TPG = 1
+ XJ = 3E-7 LD = 4.271014E-12 WD = 7.34313E-7
+ CGDO = 1.75E-10 CGSO = 1.75E-10 CGBO = 1E-10
+ CJ = 2.944613E-4 PB = 0.9048351 MJ = 0.5
+ CJSW = 1.236957E-10 MJSW = 0.05 )
*
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