光学投影曝光法 optical projection exposure method
电子束曝光系统 electron beam exposure system
分步重复系统 step-and-repeat system
显影 development
线宽 linewidth
去胶 stripping of photoresist
氧化去胶 removing of photoresist by oxidation
等离子[体]去胶 removing of photoresist by plasma
刻蚀 etching
干法刻蚀 dry etching
反应离子刻蚀 reactive ion etching, RIE
各向同性刻蚀 isotropic etching
各向异性刻蚀 anisotropic etching
反应溅射刻蚀 reactive sputter etching
离子铣 ion beam milling,又称“离子磨削”。
等离子[体]刻蚀 plasma etching