SEMI E30.5-0302 © SEMI 2001, 20021
SEMI E30.5-0302
SPECIFICATION FOR METROLOGY SPECIFIC EQUIPMENT MODEL
This specification was technically approved by the Global Information and Control Committee and is the
direct responsibility of the North American Global Information and Control Committee. Current edition
approved by the North American Information and Control Committee on October 14 and November 27,
2001. Initially available at www.semi.org December 2001; to be published March 2002. Originally
published July 2001.
The complete specification for this product includes all
general requirements of SEMI E30.
1 Purpose
1.1 This document establishes a Specific Equipment
Model (SEM) for Metrology equipment (MSEM). The
MSEM consists of equipment characteristics and
behaviors that are applicable to this class of equipment
and are required to be implemented in addition to the
SEMI E30 fundamental requirements and additional
capabilities.
2 Scope
2.1 The scope of this document is limited to defining
the behavior of Metrology equipment as perceived by a
SEMI Equipment Communications Standard II (SECS
II/SEMI E5) host that complies with the SEMI E30
model. It defines the view of the equipment through the
SECS II link. It does not define the internal operation of
the equipment. It includes a specific processing state
model as the basis for all equipment behavior of this
class.
2.2 This document assumes that the SEMI E30
fundamental requirements and all additional capabilities
except those noted in SEMI E30 Capabilities Section in
this document have been implemented on the MSEM
equipment. This document expands the SEMI E30
Standard requirements and capabilities in the areas of
the processing state model, collection events, Process
Program management, remote commands, data item
variables, and coordinate systems.
2.3 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
3 Limitations
3.1 The intent of this document is to facilitate the
integration of Metrology equipment into an automated
semiconductor factory. This document accomplishes
this by defining an operational model for Metrology
equipment as viewed by a factory automation
controller. This definition provides a standard host
interface and equipment operational behavior. This
document applies specifically to Metrology equipment
as used in a semiconductor factory environment. It is
possible that this methodology and techniques may
apply to other industries.
3.2 MSEM job parameters that specify material (e.g.,
carrier ID and substrate ID) and material locations (e.g.,
carrier location ID and carrier slot ID) are intended for
metrology equipment for 200 mm and smaller substrate.
4 Referenced Standards
NOTE 1: As listed or revised, all documents cited shall be the
latest publications of adopted standards.
4.1 SEMI Standards
SEMI E5 SEMI Equipment Communications
Standard II (SECS II)
SEMI M20 — Specification for Establishing a Wafer
Coordinate System
SEMI M21 Assigning Addresses to Rectangular
Elements in a Cartesian Array
SEMI E37.1 High Speed Messaging Service
(HSMS-SS) Single Session
SEMI E58 Automated Reliability and Availability
Standard (ARAMS)
5 Terminology
5.1 Definitions
5.1.1 alignment, n. — a procedure in which a
coordinate system is established on a substrate or a
portion of a substrate.
5.1.2 alignment mark, n. — a feature on a substrate
selectively used for alignment.
5.1.3 alignment site, n. — a point within a feature on a
substrate selectively used for alignment.
5.1.4 cleanup, n. — deselection of the current Process
Program and removal of all material to output locations
and any equipment specific activities required to
transition the equipment into the IDLE state.
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